Атомно-слоевое осаждение: реакторы и применение

атомно-слоевое осаждение; реакторы; поверхностное реакции; равномерные тонкие пленки.

Взаимодействие электромагнитного излучения с магнитно-функционализированным УНТ-нанокомпозитом в субтерагерцовом диапазоне частот, Разработка и исследование МДП-варикапов с переносом заряда, ...

ТЕХНОЛОГИЯ МИКРО- И НАНОЭЛЕКТРОНИКИ MICRO- AND NANOELECTRONIC TECHNOLOGY Atomic Layer Deposition: Reactors and Layer Applications V.I. Kuznetsov Company Levitech (Almere, The Netherlands) УДК 621.793:[539.23:539.216.1] Атомно-слоевое осаждение: реакторы и применение В. <...> Кузнецов Компания «Levitech» (Алмере, Нидерланды) Atomic Layer Deposition has emerged as a powerful, and frequently preferred, deposition technology. <...> The interest in ALD has increased considerably in the last decade due to exceptional properties of ALD. <...> ALD can be employed for the most demanding applications due to its superior conformality, large area uniformity and atomic level accuracy in controlling film thickness and composition. <...> An important challenge for the industrial application of ALD is the reactor that needs to be designed to allow for the fast and cost-effective growth of films. <...> This paper gives a short review of ALD principals, the types of ALD that can be performed, reactor designs and the main areas of ALD layer applications. <...> Keywords: atomic layer deposition; selflimiting surface reactions; uniform conformal thin films. <...> Atomic Layer Deposition (ALD) is a gas phase method based on sequential, self-limiting surface reactions, which belongs to the general class of Chemical Vapor Deposition (CVD) techniques. <...> During the past decades, significant growth has been seen in the materials made by ALD, applications, and commercially available ALD equipment [1]. <...> ЭЛЕКТРОНИКА Том 20 4 2015 365 V.I. Kuznetsov positing high quality, uniform and conformal thin films at relatively low temperatures. <...> These outstanding properties can be employed to face processing challenges for various types of next generation solar cells; therefore, ALD for photovoltaics (PV) has attracted great interest in academic research and industrial applications in recent years [3]. <...> Range of ALD applications in different industries continuously grows: optical and biomedical coatings, creating materials with unique properties, displays, energy capture and storage, solid state lighting, biotechnologies and other. <...> ALD has been invented in the Soviet Union in the 1960s (published under the name “molecular layering” technique) [5]. <...> The ALD principles were transferred to the thin film deposition technology in Finland in the 1970s <...>

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